Previous studies show remarkable differences in the simulation of electron depth dose profiles of ruthenium eye plaques. We examined the influence of the scoring and simulation geometry, the source spectrum and the multiple scattering algorithm on the depth dose profile using GEANT4. The simulated absolute dose deposition agrees with absolute dose data from the manufacturer within the measurement uncertainty. Variations in the simulation geometry as well as the source spectrum have only a small influence on the depth dose profiles. However, the multiple scattering algorithms have the largest influence on the depth dose profiles. They deposit up to 20% less dose compared to the single scattering implementation. We recommend researchers who are interested in simulating low- to medium-energy electrons to examine their simulation under the influence of different multiple scattering settings. Since the simulation and scoring geometry as well as the exact physics settings are best des...
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Objectives To optimise medical students’ early clerkship is a complex task since it is conducted in a context primarily organised to take ca...
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Abstract Purpose Overcoming the flaws of current data management conditions in head and neck oncology could enable integrated informatio...
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1 abqls-210rm.html Read the latest Journal of Clinical Neurophysiology - Vol. 37, No. 1, January 2020.eml 2 agx3v-nxz96.html Read the late...
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Cone-beam CT (CBCT) is a widely used intra-operative imaging modality in image-guided radiotherapy and surgery. A short scan followed by a f...
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by Yanwei Li, Haifeng Liu, Wei Zeng, Jing Wei An increase in the osmolarity of tears induced by excessive evaporation of the aqueous tear p...
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Targeted sequencing-based analyses of candidate gene variants in ulcerative colitis-associated colorectal neoplasia British Journal of Canc...
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